The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 14, 2017
Filed:
Dec. 15, 2014
Tokyo Electron Limited, Tokyo, JP;
Ryoichi Uemura, Koshi, JP;
Yasushi Takiguchi, Koshi, JP;
Tokyo Electron Limited, Minato-Ku, JP;
Abstract
A substrate cleaning method includes: a first step in which a cleaning liquid is ejected from a nozzle Nto a central portion of a wafer W; a second step in which a dry gas is ejected from a nozzle Nto the central portion of the wafer W to form a dry area; a third step in which the cleaning liquid is ejected from the nozzle Nwhile the nozzle Nis moved from a central side of the wafer W to a peripheral side thereof; a fourth step in which a width of an intermediate area generated between a wet area and the dry area is acquired; and a fifth step in which, when the width of the intermediate area exceeds a predetermined threshold value, a process parameter is changed such that the width of the intermediate area becomes the threshold value or less.