The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 14, 2017
Filed:
Sep. 18, 2014
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Shinji Furukawa, Nirasaki, JP;
Naoki Watanabe, Nirasaki, JP;
Hiroshi Miki, Nirasaki, JP;
Tooru Kitada, Nirasaki, JP;
Yasuhiko Kojima, Nirasaki, JP;
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); H01J 37/34 (2006.01); C23C 14/08 (2006.01);
U.S. Cl.
CPC ...
C23C 14/3464 (2013.01); C23C 14/08 (2013.01); C23C 14/3485 (2013.01); H01J 37/347 (2013.01); H01J 37/3417 (2013.01); H01J 37/3444 (2013.01); H01J 37/3464 (2013.01);
Abstract
System and method of insulating film deposition. A sputter deposition chamber comprises a pair of targets made of the same insulating material. Each target is applied with a high frequency power signal concurrently. A phase adjusting unit is used to adjust the phase difference between the high frequency power signals supplied to the pair of targets to a predetermined value, thereby improving the in-plane thickness distribution of a resultant film. The predetermined value is target material specific.