The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 07, 2017
Filed:
Mar. 23, 2015
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventors:
Johannes Wangler, Koenigsbronn, DE;
Johannes Eisenmenger, Ulm, DE;
Markus Deguenther, Aalen, DE;
Michael Patra, Oberkochen, DE;
Assignee:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/54 (2006.01); G03F 7/20 (2006.01); G02B 26/08 (2006.01); G01B 11/14 (2006.01); G01M 11/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70033 (2013.01); G01B 11/14 (2013.01); G01M 11/005 (2013.01); G02B 26/0833 (2013.01); G03F 7/70075 (2013.01); G03F 7/7085 (2013.01); G03F 7/70116 (2013.01);
Abstract
An EUV lithography system has an EUV beam path and a monitor beam path. The EUV beam path includes a mirror system having plurality of mirror elements, the orientations of which can be changed. The monitor beam path includes a monitor radiation source, a screen and a spatially resolving detector. The mirror system is arranged in the monitor beam path between the monitor radiation source and the screen.