The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 31, 2017
Filed:
Aug. 27, 2013
Applicant:
Freescale Semiconductor, Inc., Austin, TX (US);
Inventors:
Evgueniy Stefanov, Vielle Toulouse, FR;
Edouard de Fresart, Tempe, AZ (US);
Philippe Dupuy, Toulouse, FR;
Assignee:
NXP USA, Inc., Austin, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/76 (2006.01); H01L 29/94 (2006.01); H01L 29/78 (2006.01); H01L 29/40 (2006.01); H01L 29/423 (2006.01); H01L 29/66 (2006.01); H01L 29/08 (2006.01); H01L 27/088 (2006.01); H01L 29/06 (2006.01); H01L 29/10 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7811 (2013.01); H01L 27/088 (2013.01); H01L 29/0642 (2013.01); H01L 29/086 (2013.01); H01L 29/0865 (2013.01); H01L 29/0882 (2013.01); H01L 29/1095 (2013.01); H01L 29/404 (2013.01); H01L 29/407 (2013.01); H01L 29/4236 (2013.01); H01L 29/42376 (2013.01); H01L 29/66734 (2013.01); H01L 29/7813 (2013.01);
Abstract
A semiconductor device comprises a first contact layer, a first drift layer adjacent the first contact layer, a buried body layer adjacent the first drift layer and a second contact layer. A first vertical trench and a second vertical trench are provided, the first and second vertical trenches being spaced with respect to each other and extending from the second contact layer to substantially beyond the buried body layer. A second drift layer is also provided and sandwiched between the buried body layer and the second contact layer.