The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 24, 2017

Filed:

Jun. 26, 2012
Applicants:

Scott A. Young, Soquel, CA (US);

Guoheng Zhao, Milpitas, CA (US);

Nanchang Zhu, Shanghai, CN;

Neeraj Khanna, Santa Clara, CA (US);

Inventors:

Scott A. Young, Soquel, CA (US);

Guoheng Zhao, Milpitas, CA (US);

NanChang Zhu, Shanghai, CN;

Neeraj Khanna, Santa Clara, CA (US);

Assignee:

KLA-Tencor Corporation, Milpitas, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/66 (2006.01); G01N 21/95 (2006.01);
U.S. Cl.
CPC ...
H01L 22/24 (2013.01); G01N 21/9503 (2013.01); H01L 22/12 (2013.01);
Abstract

A semiconductor wafer inspection system includes a camera and two or more illuminators. The illuminators illuminate a line of the semiconductor wafer in sequence and the camera captures an interleaved image of illuminated lines such that the individual images can be recovered from the interleaved image. The semiconductor wafer can be moved by a conveyor so that adjacent lines can be sequentially illuminated by the illuminators. The camera may include two or more line sensors.


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