The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2017
Filed:
Mar. 30, 2012
Applicants:
Taro Ikeda, Nirasaki, JP;
Tomohito Komatsu, Nirasaki, JP;
Shigeru Kasai, Nirasaki, JP;
Inventors:
Assignee:
TOKYO ELECTRONICS LIMITED, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C23F 1/00 (2006.01); H01L 21/306 (2006.01); H01J 37/32 (2006.01); C23C 16/455 (2006.01); H05H 1/46 (2006.01); C23C 16/511 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3222 (2013.01); C23C 16/45565 (2013.01); C23C 16/511 (2013.01); H01J 37/3244 (2013.01); H01J 37/32211 (2013.01); H01J 37/32229 (2013.01); H01J 37/32449 (2013.01); H05H 1/46 (2013.01); H05H 2001/463 (2013.01);
Abstract
A plasma generation antenna and a plasma processing apparatus can supply a gas and an electromagnetic wave effectively. A plasma processing apparatusincludes a processing chamberin which a plasma process is performed; a wavelength shortening plateconfigured to transmit an electromagnetic wave; and a plasma generation antennahaving a shower headprovided adjacent to the wavelength shortening plate. The shower headis made of a conductor, and has a multiple number of gas holesand a multiple number of slotsthrough which the electromagnetic wave passes. The slotsare provided at positions isolated from the gas holes