The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 27, 2016
Filed:
May. 30, 2012
Toshio Yokoyama, Tokyo, JP;
Junji Kunisawa, Tokyo, JP;
Mitsuru Miyazaki, Tokyo, JP;
Kenichi Suzuki, Tokyo, JP;
Hiroshi Sotozaki, Tokyo, JP;
Toshio Yokoyama, Tokyo, JP;
Junji Kunisawa, Tokyo, JP;
Mitsuru Miyazaki, Tokyo, JP;
Kenichi Suzuki, Tokyo, JP;
Hiroshi Sotozaki, Tokyo, JP;
EBARA CORPORATION, Tokyo, JP;
Abstract
A substrate processing apparatus can prevent photo-corrosion of, e.g., copper interconnects due to exposure of a surface to be processed of a substrate to light, and can perform processing, such as cleaning, of a substrate surface while preventing photo-corrosion of, e.g., copper interconnects due to exposure to light. The substrate processing apparatus includes a plurality of processing areas housing therein processing units which have been subjected to light shielding processing; and at least one transfer area housing therein a transfer robot and disposed between two adjacent ones of the plurality of processing areas. A light shielding wall is provided between the transfer area and each of the two adjacent processing areas, and a light-shielding maintenance door is provided for the front opening of the transfer area. The processing units are coupled to the light shielding walls in a light-shielding manner.