The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 27, 2016
Filed:
Nov. 30, 2015
Nuflare Technology, Inc., Yokohama-shi, JP;
Ntt Advanced Technology Corporation, Kawasaki-shi, JP;
Kazuhiro Chiba, Sagamihara, JP;
Hiroshi Matsumoto, Yokohama, JP;
Munehiro Ogasawara, Hiratsuka, JP;
Ryoichi Yoshikawa, Kawasaki, JP;
Hirofumi Morita, Setagaya-ku, JP;
Hirokazu Yamada, Mishima, JP;
Teruaki Safu, Atsugi, JP;
Toshifumi Konishi, Machida, JP;
Takaaki Matsushima, Atsugi, JP;
Kazuhisa Kudo, Atsugi, JP;
Masaki Yano, Atsugi, JP;
Katsuyuki Machida, Atsugi, JP;
NuFlare Technology, Inc., Yokohama-shi, JP;
NTT Advanced Technology Corporation, Kawasaki-shi, JP;
Abstract
A method for fabricating a blanking aperture array device for multi-beams includes forming, using a substrate over which a first insulating film, a first metal film, a second insulating film, and a second metal film are laminated in order, electrodes and pads on the second metal film, removing a part of the second metal film, removing the second insulating film using, as a mask, the electrodes, the pads, and a remaining part of the second metal film, and forming openings each being between a pair of electrodes, wherein, a part of the second metal film is etched such that some part of it remains in regions each connecting one of the electrodes and one of the pads, and a region in which entire openings are formed except the openings themselves is configured by the electrodes, pads, and first and second metal films such that the insulating film is not exposed.