The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 27, 2016
Filed:
Mar. 13, 2015
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Jan Steven Christiaan Westerlaken, Heesch, NL;
Gerardus Arnoldus Hendricus Franciscus Janssen, Eindhoven, NL;
Peter Paul Steijaert, Eindhoven, NL;
Engelbertus Antonius Fransiscus Van Der Pasch, Oirschot, NL;
Franciscus Van De Mast, Eindhoven, NL;
Assignee:
ASML NETHERLANDS B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/52 (2006.01); G03B 27/42 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70608 (2013.01); G03F 7/7085 (2013.01); G03F 7/70341 (2013.01); G03F 7/70775 (2013.01); G03F 7/70908 (2013.01);
Abstract
A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.