The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 20, 2016

Filed:

Nov. 20, 2014
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Takashi Tanaka, Nirasaki, JP;

Yuichiro Inatomi, Nirasaki, JP;

Kazutoshi Iwai, Nirasaki, JP;

Mitsuaki Iwashita, Nirasaki, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 28/00 (2006.01); C23C 28/02 (2006.01); C23C 18/04 (2006.01); C23C 18/06 (2006.01); C23C 18/16 (2006.01); C23C 18/32 (2006.01); H01L 21/768 (2006.01); H01L 21/288 (2006.01); C23C 18/18 (2006.01); C23C 18/02 (2006.01); C23C 18/12 (2006.01); C23C 18/38 (2006.01);
U.S. Cl.
CPC ...
C23C 28/34 (2013.01); C23C 18/04 (2013.01); C23C 18/06 (2013.01); C23C 18/165 (2013.01); C23C 18/1893 (2013.01); C23C 18/32 (2013.01); C23C 28/00 (2013.01); C23C 28/021 (2013.01); C23C 28/321 (2013.01); H01L 21/288 (2013.01); H01L 21/76874 (2013.01); H01L 21/76898 (2013.01); C23C 18/02 (2013.01); C23C 18/1275 (2013.01); C23C 18/1651 (2013.01); C23C 18/1851 (2013.01); C23C 18/1865 (2013.01); C23C 18/1868 (2013.01); C23C 18/38 (2013.01);
Abstract

A pre-treatment method for plating can form a plating layer having sufficient adhesivity on an inner surface of a recess and on a surface of a substrate at an outside of the recess even when the recess has a high aspect ratio. The pre-treatment method for plating includes a preparation process of preparing the substrate having the recess; a first coupling layer forming process of forming a first coupling layerat least on the inner surface of the recess of the substrate by using a first coupling agent; and a second coupling layer forming process of forming a second coupling layerat least on the surface of the substrate at the outside of the recess by using a second coupling agent after the first coupling layer forming process.


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