The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 13, 2016
Filed:
Apr. 02, 2012
Chikako Takahashi, Kurokawa-gun, JP;
Takashi Suzuki, Sendai-shi, JP;
Masato Horiguchi, Kurokawa-gun, JP;
Takashi Yamamoto, Kurokawa-gun, JP;
Chikako Takahashi, Kurokawa-gun, JP;
Takashi Suzuki, Sendai-shi, JP;
Masato Horiguchi, Kurokawa-gun, JP;
Takashi Yamamoto, Kurokawa-gun, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
An electrode assembly of a plasma processing apparatus that enables damage to an electrode plate to be prevented, and enables an increase in the number of parts to be prevented, so that the ability to carry out maintenance can be easily maintained. An upper electrode assembly has an upper electrode plate, a cooling plate (C/P) and a spacer interposed between the upper electrode plate and the C/P. The upper electrode plate has therein electrode plate gas-passing holes that penetrate through the upper electrode plate. The C/P has therein C/P gas-passing holes that penetrate through the C/P. The spacer has therein spacer gas-passing holes that penetrate through the spacer. The electrode plate gas-passing holes, the C/P gas-passing holes and the spacer gas-passing holes are not disposed collinearly.