The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 06, 2016
Filed:
Jun. 05, 2013
Asml Netherlands B.v., Veldhoven, NL;
Asml Holding N.v., Veldhoven, NL;
Jan Steven Christiaan Westerlaken, Heesch, NL;
Ruud Hendrikus Martinus Johannes Bloks, Helmond, NL;
Peter A. Delmastro, New Milford, CT (US);
Thibault Simon Mathieu Laurent, Eindhoven, NL;
Martinus Hendrikus Antonius Leenders, Rhoon, NL;
Mark Josef Schuster, Fairfield, CT (US);
Christopher Charles Ward, Somerville, MA (US);
Frank Johannes Jacobus Van Boxtel, Eindhoven, NL;
Justin Matthew Verdirame, Cambridge, MA (US);
Samir A. Nayfeh, Shrewsbury, MA (US);
ASML NETHERLANDS B.V., Veldhoven, NL;
ASML HOLDING N.V., Veldhoven, NL;
Abstract
A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.