The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 06, 2016
Filed:
Aug. 22, 2014
Applicant:
N&k Technology Inc., San Jose, CA (US);
Inventors:
Christopher Rush, Forestvilee, CA (US);
John C. Lam, Brentwood, CA (US);
Assignee:
n&k Technology, Inc., San Jose, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 9/02 (2006.01); G01B 11/24 (2006.01);
U.S. Cl.
CPC ...
G01B 11/2441 (2013.01);
Abstract
A collimated laser beam is directed towards the wafer bottom such that the impinging light is partially forward deflected along the vias' bottom edges. Concentric laser interference fringes occur on the wafer top from constructive and destructive interference between the forward deflected and directly through propagating laser. A top down optical image from a number of vias' top openings and a top down fringe image from the same vias' concentric fringe sets are processed to three dimensionally characterize the vias.