The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 15, 2016
Filed:
Apr. 05, 2013
Asml Netherlands B.v., Veldhoven, NL;
Carlo Cornelis Maria Luijten, Duizel, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
Disclosed is a contamination trap arrangement () configured to trap debris particles that are generated with the formation of a plasma within a radiation source configured to generate extreme ultraviolet radiation. The contamination trap comprises a vane structure () for trapping the debris particles; a heating arrangement () for heating the vane structure, the heating arrangement being in thermal communication with the vane structure; a cooling arrangement () for transporting heat generated as a result of the plasma formation, away from the vane structure, and a gap () between the heating arrangement and the cooling arrangement. The cooling arrangement is in thermal communication with the vane structure via the heating arrangement and the gap and the contamination trap also comprises a heat transfer adjustment arrangement operable to adjust the heat transfer characteristics of a fluid inside of the gap by providing for controllable relative movement between the surfaces defining the gap.