The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 08, 2016
Filed:
Apr. 15, 2015
Applicant:
United Microelectronics Corp., Hsin-Chu, TW;
Inventors:
Chia-Ching Lin, Kaohsiung, TW;
En-Chiuan Liou, Tainan, TW;
Chia-Hung Wang, Taichung, TW;
Sho-Shen Lee, New Taipei, TW;
Assignee:
UNITED MICROELECTRONICS CORP., Hsin-Chu, TW;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/544 (2006.01); H01L 21/68 (2006.01); H01L 29/78 (2006.01);
U.S. Cl.
CPC ...
H01L 23/544 (2013.01); H01L 29/785 (2013.01); H01L 2223/5442 (2013.01); H01L 2223/54426 (2013.01);
Abstract
An overlay mark for determining the alignment between two separately generated patterns formed along with two successive layers above a substrate is provided in the present invention, wherein both the substrate and the overlay mark include at least two pattern zones having periodic structures with different orientations, and the periodic structures of the overlay mark are orthogonally overlapped with the periodic structures of the substrate.