The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 01, 2016

Filed:

Aug. 24, 2015
Applicant:

Avogy, Inc., San Jose, CA (US);

Inventors:

Isik C. Kizilyalli, San Francisco, CA (US);

Hui Nie, Cupertino, CA (US);

Andrew P. Edwards, San Jose, CA (US);

Richard J. Brown, Los Gatos, CA (US);

Donald R. Disney, Cupertino, CA (US);

Assignee:

Avogy, Inc., San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/868 (2006.01); H01L 29/06 (2006.01); H01L 21/20 (2006.01); H01L 29/66 (2006.01); H01L 29/20 (2006.01);
U.S. Cl.
CPC ...
H01L 29/868 (2013.01); H01L 29/0615 (2013.01); H01L 29/0649 (2013.01); H01L 29/2003 (2013.01); H01L 29/66204 (2013.01); H01L 29/6631 (2013.01); H01L 29/66212 (2013.01); H01L 29/66924 (2013.01);
Abstract

A III-nitride semiconductor device includes an active region for supporting current flow during forward-biased operation of the III-nitride semiconductor device. The active region includes a first III-nitride epitaxial material having a first conductivity type, and a second III-nitride epitaxial material having a second conductivity type. The III-nitride semiconductor device further includes an edge-termination region physically adjacent to the active region and including an implanted region comprising a portion of the first III-nitride epitaxial material. The implanted region of the first III-nitride epitaxial material has a reduced electrical conductivity in relation to portions of the first III-nitride epitaxial material adjacent to the implanted region


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