The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 25, 2016
Filed:
Sep. 24, 2014
Applicant:
Sandisk Technologies Inc., Plano, TX (US);
Inventors:
Kiyokazu Shishido, Yokkaichi, JP;
Takuya Futase, Yokkaichi, JP;
Hiroto Ohori, Yokkaichi, JP;
Kotaro Jinnouchi, Yokkaichi, JP;
Noritaka Fukuo, Yokkaichi, JP;
Yuji Takahashi, Yokkaichi, JP;
Fumiaki Toyama, San Jose, CA (US);
Assignee:
SanDisk Technologies LLC, Plano, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/44 (2006.01); H01L 21/768 (2006.01); H01L 27/02 (2006.01); H01L 27/115 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76892 (2013.01); H01L 27/0207 (2013.01); H01L 27/11524 (2013.01);
Abstract
Wide and narrow mandrels that are used to form sidewall spacers for patterning are formed in a sacrificial layer with openings in wide mandrels near sides of the wide mandrels. Sidewall spacers are formed on the sides of mandrels and the sacrificial layer is removed. The sidewall spacers are then used for patterning of underlying layers.