The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 25, 2016
Filed:
Aug. 20, 2014
Applicant:
Lam Research Corporation, Fremont, CA (US);
Inventors:
Shruti Vivek Thombare, Sunnyvale, CA (US);
Ishtak Karim, San Jose, CA (US);
Sanjay Gopinath, Fremont, CA (US);
Michal Danek, Cupertino, CA (US);
Assignee:
Lam Research Corporation, Fremont, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/44 (2006.01); H01L 21/3205 (2006.01); C23C 16/505 (2006.01); H01L 21/321 (2006.01); C23C 16/14 (2006.01); C23C 16/448 (2006.01); C23C 16/455 (2006.01); C23C 16/34 (2006.01);
U.S. Cl.
CPC ...
H01L 21/32053 (2013.01); C23C 16/14 (2013.01); C23C 16/4485 (2013.01); C23C 16/45542 (2013.01); C23C 16/45553 (2013.01); C23C 16/505 (2013.01); H01L 21/321 (2013.01); H01L 21/32051 (2013.01); C23C 16/34 (2013.01);
Abstract
Methods of depositing highly conformal and pure titanium films at low temperatures are provided. Methods involve exposing a substrate to titanium tetraiodide, purging the chamber, exposing the substrate to a plasma, purging the chamber, and repeating these operations. Titanium films are deposited at low temperatures less than about 450° C.