The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 18, 2016
Filed:
Oct. 22, 2015
Applicant:
United Microelectronics Corp., Hsin-Chu, TW;
Inventors:
Che-Yi Lin, Kaohsiung, TW;
En-Chiuan Liou, Tainan, TW;
Yi-Jing Wang, Tainan, TW;
Chia-Hsun Tseng, Tainan, TW;
Assignee:
UNITED MICROELECTRONICS CORP., Hsin-Chu, TW;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); H01L 21/30 (2006.01); H01L 21/02 (2006.01); H01L 21/32 (2006.01); H01L 21/26 (2006.01); H01L 21/31 (2006.01); G03F 7/20 (2006.01); H01L 21/266 (2006.01); H01L 21/308 (2006.01); H01L 21/311 (2006.01); H01L 21/3213 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70633 (2013.01); H01L 21/027 (2013.01); H01L 21/02642 (2013.01); H01L 21/266 (2013.01); H01L 21/308 (2013.01); H01L 21/3081 (2013.01); H01L 21/3085 (2013.01); H01L 21/3086 (2013.01); H01L 21/3088 (2013.01); H01L 21/31144 (2013.01); H01L 21/32139 (2013.01);
Abstract
An overlay mask includes a plurality of first patterns, a plurality of second patterns and a plurality of third patterns. The first patterns are arranged within a first pitch. The second patterns are arranged within a second pitch. A first portion of the third patterns are arranged alternately with the first patterns, within the first pitch, and a second portion of the third patterns are arranged alternately with the second patterns, within the second pitch, and the first pitch is not equal to the second pitch.