The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 11, 2016

Filed:

Dec. 27, 2013
Applicant:

Intermolecular, Inc., San Jose, CA (US);

Inventors:

Jeroen Van Duren, Palo Alto, CA (US);

Minh Huu Le, San Jose, CA (US);

Minh Anh Nguyen, San Jose, CA (US);

Sandeep Nijhawan, Los Altos, CA (US);

Assignee:

Intermolecular, Inc., San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 5/06 (2006.01); H01L 21/30 (2006.01); B08B 3/04 (2006.01); G11C 13/00 (2006.01); H01L 27/24 (2006.01); C23C 14/08 (2006.01); C23C 14/22 (2006.01); C23C 14/34 (2006.01); H01L 21/02 (2006.01); H01L 21/66 (2006.01); H01L 45/00 (2006.01); H01L 21/306 (2006.01); H01L 21/67 (2006.01); C23C 18/16 (2006.01); C25D 17/02 (2006.01); B01J 19/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/30 (2013.01); B01J 19/0046 (2013.01); B08B 3/04 (2013.01); C23C 14/08 (2013.01); C23C 14/22 (2013.01); C23C 14/34 (2013.01); C23C 18/1619 (2013.01); C23C 18/1682 (2013.01); C25D 17/02 (2013.01); G11C 13/0004 (2013.01); H01L 21/02104 (2013.01); H01L 21/30604 (2013.01); H01L 21/6719 (2013.01); H01L 21/67051 (2013.01); H01L 21/67057 (2013.01); H01L 22/10 (2013.01); H01L 22/12 (2013.01); H01L 22/14 (2013.01); H01L 27/2463 (2013.01); H01L 45/1608 (2013.01); B01J 2219/0038 (2013.01); B01J 2219/00283 (2013.01); B01J 2219/00286 (2013.01); B01J 2219/00301 (2013.01); B01J 2219/00313 (2013.01); B01J 2219/00382 (2013.01); B01J 2219/00416 (2013.01); B01J 2219/00418 (2013.01); B01J 2219/00527 (2013.01); B01J 2219/00585 (2013.01);
Abstract

A substrate having a plurality of site-isolated regions defined thereon is provided. A first electrochromic material, or a first electrochromic device stack, is formed above a first of the plurality of site-isolated regions using a first set of processing conditions. A second electrochromic material, or a second electrochromic device stack, is formed above a second of the plurality of site-isolated regions using a second set of processing conditions. The second set of processing conditions is different than the first set of processing conditions.


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