The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 04, 2016
Filed:
Nov. 26, 2013
Nuflare Technology, Inc., Yokohama, JP;
Sumito Nakada, Kanagawa, JP;
Hikaru Yamamura, Kanagawa, JP;
Osamu Iizuka, Kanagawa, JP;
Hideyuki Tsurumaki, Kanagawa, JP;
NuFlare Technology, Inc., Yokohama, JP;
Abstract
A charged particle beam writing method according to embodiments of the present disclosure includes: storing in a charged particle beam writing apparatus a position coordinate at which a drift amount is diagnosed; storing in the charged particle beam writing apparatus first and second time interval patterns which define time intervals to diagnose the drift amount of the charged particle beam; performing first writing of irradiating a target object with the charged particle beam, and writing a writing pattern on the target object while diagnosing the drift amount based on the first time interval pattern during the writing; and performing second writing of writing a predetermined writing pattern while diagnosing the drift amount when the writing reaches the position coordinate and diagnosing the drift amount based on the second time interval pattern during the writing after the writing reaches the position coordinate.