The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 04, 2016
Filed:
May. 18, 2009
Applicants:
You-jin Wang, Milpitas, CA (US);
Chung-shih Pan, Palo Alto, CA (US);
Inventors:
You-Jin Wang, Milpitas, CA (US);
Chung-Shih Pan, Palo Alto, CA (US);
Assignee:
HERMES MICROVISION, INC., Hsin-Chu, TW;
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/28 (2006.01); H01J 37/02 (2006.01);
U.S. Cl.
CPC ...
H01J 37/02 (2013.01); H01J 37/28 (2013.01); H01J 2237/0041 (2013.01); H01J 2237/0044 (2013.01);
Abstract
A layer of conductive or semi-conductive material is formed on a surface of a sample and then the sample, when being charged particle beam imaged, is electrically coupled with an object having a large charge-receiving or charge-storage capacity (e.g., capacitance). Hence, the charging on the sample surface is removed and released quickly by the layer. The layer is then removed by reacting it with a predefined agent. The reaction forms a gaseous product which does not form a physical or chemical bond to the sample surface.