The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 04, 2016
Filed:
Oct. 12, 2012
Robert Gabriël Maria Lansbergen, Schiedam, NL;
Peter C. Kochersperger, Easton, CT (US);
David Ramirez, Danbury, CT (US);
Xugang Xiong, Wilton, CT (US);
George Hilary Harrold, Wilton, CT (US);
Arindam Sinharoy, Wilton, CT (US);
Robert Gabriël Maria Lansbergen, Schiedam, NL;
Peter C. Kochersperger, Easton, CT (US);
David Ramirez, Danbury, CT (US);
Xugang Xiong, Wilton, CT (US);
George Hilary Harrold, Wilton, CT (US);
Arindam Sinharoy, Wilton, CT (US);
ASML HOLDING N.V., Veldhoven, NL;
Abstract
An apparatus and a method to hold a patterning device configured to impart a beam of radiation with a pattern in its cross-section. The apparatus includes a base configured to support the patterning device and an inner cover couplable to the base. The inner cover includes a restraining mechanism that, upon an application of a force external to the inner cover, is configured to provide an in-plane force to the patterning device to restrain movement of the patterning device, the in-plane force being substantially parallel to a patterning surface of the patterning device.