The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 27, 2016
Filed:
Jul. 10, 2015
Overlay measuring method and system, and method of manufacturing semiconductor device using the same
Seong-jin Yun, Yongin-si, KR;
Woo-seok Ko, Seoul, KR;
Yu-sin Yang, Seoul, KR;
Sang-kil Lee, Yongin-si, KR;
Chung-sam Jun, Suwon-si, KR;
Seong-Jin Yun, Yongin-si, KR;
Woo-Seok Ko, Seoul, KR;
Yu-Sin Yang, Seoul, KR;
Sang-Kil Lee, Yongin-si, KR;
Chung-Sam Jun, Suwon-si, KR;
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, Gyeonggi-do, KR;
Abstract
An overlay measuring method includes irradiating an electron beam onto a sample, including a multi-layered structure of overlapped upper and lower patterns formed thereon, to obtain an actual image of the upper and lower patterns. A first image representing the upper pattern and a second image representing the lower pattern are obtained from the actual image. A reference position for the upper and lower patterns is determined from a design image of the upper and lower patterns. A position deviation of the upper pattern with respect to the reference position in the first image and a position deviation of the lower pattern with respect to the reference position in the second image are calculated to determine an overlay between the upper pattern and the lower pattern.