The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 20, 2016
Filed:
Mar. 26, 2012
Andrei Mikhailovich Yakunin, Mierlo, NL;
Denis Alexandrovich Glushkov, Alfter, DE;
Vladimir Nikolaevich Polkovnikov, Nizhny Novgorod, RU;
Nikolay Nikolaevitch Salashchenko, Nizhny Novgorod, RU;
Leonid Aizikovitch Sjmaenok, Vaals, NL;
Andrei Mikhailovich Yakunin, Mierlo, NL;
Denis Alexandrovich Glushkov, Alfter, DE;
Vladimir Nikolaevich Polkovnikov, Nizhny Novgorod, RU;
Nikolay Nikolaevitch Salashchenko, Nizhny Novgorod, RU;
Leonid Aizikovitch Sjmaenok, Vaals, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A multilayer mirror for use in device lithography is configured to reflect and/or pattern radiation having a wavelength in the range of about 6.4 nm to about 7.2 nm. The multilayer mirror has a plurality of alternating layers of materials. The plurality of alternating layers of materials include first layers of materials and second layers of materials. The second layers have a higher refractive index for the radiation than the first layers. The materials of the first layers and the materials of the second layers are mutually chemically unreactive at an interface therebetween at temperatures less than 300° C. This may allow the mirrors to have a narrow boundary region of intermingled materials from alternating layers between the layers, for example of 0.5 nm or less in width, which may improve sharpness of the boundary region and improve reflectivity.