The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 20, 2016
Filed:
May. 21, 2015
Applicant:
Applied Materials Israel, Ltd., Rehovot, IL;
Inventors:
Konstantin Chirko, Rehovot, IL;
Alon Litman, Nes Ziona, IL;
Assignee:
APPLIED MATERIALS ISRAEL LTD., Rehovot, IL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/00 (2006.01); G01Q 60/30 (2010.01); G01Q 30/02 (2010.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
G01Q 60/30 (2013.01); G01Q 30/02 (2013.01); H01J 37/28 (2013.01); H01J 2237/281 (2013.01); H01J 2237/2815 (2013.01);
Abstract
A system, method and a non-transitory compute readable medium for evaluating a high aspect ratio (HAR) hole having a nanometric scale width and formed in a substrate, including obtaining, during an illumination period, multiple measurement results by an electrostatic measurement device that comprises a probe tip that is placed in proximity to the HAR hole; wherein multiple locations within the HAR hole are illuminated with a beam of charged particles during the illumination period; and processing the multiple measurement results to determine a state of the HAR hole.