The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 20, 2016
Filed:
Mar. 18, 2014
Applicant:
Asm Ip Holding B.v., Almere, NL;
Inventor:
Eiichiro Shiba, Tama, JP;
Assignee:
ASM IP Holding B.V., Almere, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C23C 16/455 (2006.01); C23C 16/40 (2006.01); C23C 16/448 (2006.01); C23C 16/505 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45561 (2013.01); C23C 16/401 (2013.01); C23C 16/448 (2013.01); C23C 16/45536 (2013.01); C23C 16/505 (2013.01);
Abstract
A method for performing uniform processing in multiple reaction chambers includes (a) conducting a cycle constituted by steps in each reaction chamber according to the order of the reaction chambers at which the steps are conducted; and then (b) conducting the steps in each reaction chamber after changing the immediately prior order of the reaction chambers at which the steps are conducted; and then (c) repeating process (b) until a target treatment is complete at the multiple reaction chambers. The target treatment conducted on a substrate in each reaction chamber is the same.
Published as:
US2015267297A1; KR20150108781A; JP2015179843A; TW201546323A; US9447498B2; JP6516517B2; TWI670390B; KR102362025B1;