The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 13, 2016
Filed:
Apr. 01, 2015
Applicant:
Globalfoundries Inc., Grand Cayman, KY;
Inventors:
Hong Yu, Rexford, NY (US);
Biao Zuo, Mechanicville, NY (US);
Jin Ping Liu, Ballston Lake, NY (US);
Huang Liu, Mechanicville, NY (US);
Assignee:
GLOBALFOUNDRIES Inc., Grand Cayman, KY;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
H01L 29/6656 (2013.01); H01L 29/66545 (2013.01); H01L 29/66795 (2013.01);
Abstract
A method includes forming a line feature above a substrate. Carbon-containing spacers are formed on sidewalls of the line feature. A first dielectric layer is formed above the carbon spacers and the line feature. The first dielectric layer is planarized to expose upper ends of the carbon-containing spacers. An ashing process is performed to remove the carbon-containing spacers and define air gaps adjacent the line feature. A cap layer is formed to seal the upper ends of the air gaps.