The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 06, 2016

Filed:

Aug. 21, 2013
Applicant:

Globalfoundries Inc., Grand Cayman, KY;

Inventors:

Kevin K. Chan, Staten Island, NY (US);

Peng Cheng, South Burlington, VT (US);

Qizhi Liu, Lexington, MA (US);

Ljubo Radic, Torrance, CA (US);

Assignee:

GLOBALFOUNDRIES Inc., Grand Cayman, KY;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/73 (2006.01); H01L 29/66 (2006.01); H01L 29/737 (2006.01); H01L 29/10 (2006.01); G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
H01L 29/73 (2013.01); G06F 17/5045 (2013.01); H01L 29/1004 (2013.01); H01L 29/66272 (2013.01); H01L 29/7371 (2013.01);
Abstract

Methods of fabricating bipolar junction transistors, bipolar junction transistors, and design structures for a bipolar junction transistor. A first portion of the intrinsic base layer is masked while a second portion of an intrinsic base layer is etched. As a consequence of the masking, the second portion of the intrinsic base layer is thinner than the first portion of the intrinsic base layer. An emitter and an extrinsic base layer are formed in respective contacting relationships with the first and second portions of the intrinsic base layer.


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