The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 06, 2016
Filed:
Dec. 17, 2014
Applicant:
United Microelectronics Corp., Hsin-Chu, TW;
Inventor:
Liang-An Huang, Tainan, TW;
Assignee:
UNITED MICROELECTRONICS CORP., Hsin-Chu City, TW;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/762 (2006.01); H01L 29/06 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76229 (2013.01); H01L 29/0653 (2013.01);
Abstract
A method of manufacturing shallow trench isolations is provided in the present invention, which includes the steps of providing a substrate, performing a zero etch to form preliminary trenches in the substrate, performing a STI etch to the preliminary trenches to form final trenches, where the final trenches are deeper and steeper than the preliminary trenches, and filling up the final trenches with insulating material to form shallow trench isolations.