The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 06, 2016
Filed:
Dec. 30, 2014
Asml Netherlands B.v., Veldhoven, NL;
Jeroen Johannes Sophia Maria Mertens, Duizel, NL;
Sjoerd Nicolaas Lambertus Donders, 's-Hertogenbosch, NL;
Roelof Frederik De Graaf, Veldhoven, NL;
Christiaan Alexander Hoogendam, Veldhoven, NL;
Antonius Johannus Van Der Net, Tilburg, NL;
Franciscus Johannes Herman Maria Teunissen, Rotterdam, NL;
Patricius Aloysius Jacobus Tinnemans, Hapert, NL;
Martinus Cornelis Maria Verhagen, Valkenswaard, NL;
Jacobus Johannus Leonardus Hendricus Verspay, Thorn, NL;
Edwin Augustinus Matheus Van Gompel, Valkenswaard, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.