The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 2016
Filed:
Nov. 29, 2012
Applicant:
Raytheon Company, Waltham, MA (US);
Inventors:
Roland W. Gooch, Dallas, TX (US);
Buu Q. Diep, Murphy, TX (US);
Stephen H. Black, Buellton, CA (US);
Thomas A. Kocian, Dallas, TX (US);
Adam M. Kennedy, Santa Barbara, CA (US);
Assignee:
RAYTHEON COMPANY, Waltham, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 5/06 (2006.01); B81B 7/00 (2006.01); B81C 1/00 (2006.01);
U.S. Cl.
CPC ...
B05D 5/061 (2013.01); B81B 7/0067 (2013.01); B81C 1/00325 (2013.01); B81B 2201/0207 (2013.01); B81C 2203/0118 (2013.01);
Abstract
Methods for reducing wafer bow induced by an anti-reflective coating of a cap wafer are provided. The method may utilize a shadow mask having at least one opening therein that is positioned opposite recessed regions in a cap wafer. The method may further include depositing at least one layer of an anti-reflective coating material through the shadow mask onto a planar side of a cap wafer to provide a discontinuous coating on the planar side.