The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 23, 2016

Filed:

Jan. 13, 2012
Applicants:

Takashi Tanaka, Nirasaki, JP;

Yusuke Saito, Nirasaki, JP;

Mitsuaki Iwashita, Nirasaki, JP;

Takayuki Toshima, Koshi, JP;

Inventors:

Takashi Tanaka, Nirasaki, JP;

Yusuke Saito, Nirasaki, JP;

Mitsuaki Iwashita, Nirasaki, JP;

Takayuki Toshima, Koshi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05C 5/00 (2006.01); B05C 9/14 (2006.01); H01L 21/3205 (2006.01); B05B 7/16 (2006.01); C23C 18/16 (2006.01); H01L 21/288 (2006.01); B05D 1/02 (2006.01); C25D 17/00 (2006.01); H01L 21/67 (2006.01); G03F 7/16 (2006.01);
U.S. Cl.
CPC ...
B05C 5/001 (2013.01); B05D 1/02 (2013.01); C23C 18/168 (2013.01); C23C 18/1614 (2013.01); C23C 18/1619 (2013.01); C23C 18/1676 (2013.01); H01L 21/288 (2013.01); C25D 17/001 (2013.01); G03F 7/162 (2013.01); H01L 21/67017 (2013.01);
Abstract

A plating apparatus includes a substrate holding/rotating device that holds/rotates a substrate; and a plating liquid supplying device that supplies a plating liquid onto the substrate. The plating liquid supplying device includes a supply tank that stores the plating liquid; a discharge nozzle that discharges the plating liquid onto the substrate; and a plating liquid supplying line through which the plating liquid of the supply tank is supplied into the discharge nozzle. Further, a first heating device is provided at either one of the supply tank and the plating liquid supplying line of the plating liquid supplying device, and heats the plating liquid to a first temperature. Furthermore, a second heating device is provided at the plating liquid supplying line between the first heating device and the discharge nozzle, and heats the plating liquid to a second temperature equal to or higher than the first temperature.


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