The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 16, 2016
Filed:
Sep. 26, 2014
Applicant:
Kla-tencor Corporation, Milpitas, CA (US);
Inventors:
Alexander Bykanov, San Diego, CA (US);
Oleg Khodykin, San Diego, CA (US);
Assignee:
KLA-Tencor Corporation, Milpitas, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05G 2/00 (2006.01); G21K 5/04 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
H05G 2/008 (2013.01); G03F 7/70033 (2013.01); G03F 7/70916 (2013.01);
Abstract
A system for producing an exclusionary buffer gas flow in an EUV light source, comprising a vacuum chamber, a light path, a plasma generation region, at least one shield, at least one through-bore arranged in the at least one shield, at least one buffer gas injector arranged within the at least one through-bore to inject a buffer gas into the light path substantially towards the plasma generation region to prevent a flow of a target material into the light path, and a vacuum pump arranged to remove the buffer gas and the target material from the vacuum chamber.