The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 16, 2016

Filed:

Nov. 13, 2014
Applicant:

Sandisk Technologies, Inc., Plano, TX (US);

Inventors:

Matthias Baenninger, Menlo Park, CA (US);

Jayavel Pachamuthu, San Jose, CA (US);

Johann Alsmeier, San Jose, CA (US);

Assignee:

SANDISK TECHNOLOGIES LLC, Plano, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/78 (2006.01); H01L 27/115 (2006.01); H01L 29/788 (2006.01); H01L 29/792 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7846 (2013.01); H01L 27/1157 (2013.01); H01L 27/11524 (2013.01); H01L 27/11551 (2013.01); H01L 27/11578 (2013.01); H01L 29/66825 (2013.01); H01L 29/66833 (2013.01); H01L 29/7889 (2013.01); H01L 29/7926 (2013.01);
Abstract

A monolithic three dimensional NAND string includes a plurality of control gate electrodes extending substantially parallel to a major surface of a substrate, and at least one trench extending substantially perpendicular to the major surface of the substrate. The trench is filled with at least a first trench material and a second trench material. The first trench material includes a material under a first magnitude of a first stress type, and the second trench material includes a material under no stress, a second stress type opposite the first stress type, or a second magnitude of the first stress type lower than the first magnitude of the first stress type to offset warpage of the substrate due to the stress imposed by at least one of the first trench material or the plurality of control gate electrodes on the substrate.


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