The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 16, 2016
Filed:
Jun. 28, 2013
Hitachi High-technologies Corporation, Minato-ku, Tokyo, JP;
Yusuke Ominami, Tokyo, JP;
Sukehiro Ito, Tokyo, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
A sample observation method includes irradiating a sample with a primary charged particle beam, detecting a secondary charged particle signal obtained by the irradiating, and observing the sample. The method is characterized by causing the primary charged particle beam generated in a charged particle optical lens barrel, which is maintained in a vacuum state, to be transmitted or passed through a separating film disposed to isolate a space in which the sample is placed from the charged particle optical lens barrel; and detecting a transmitted charged particle beam obtained by irradiating the sample, placed in an atmospheric pressure or a predetermined gas atmosphere of a slightly negative pressure state compared with the atmospheric pressure, with the primary charged particle beam.