The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 09, 2016
Filed:
May. 09, 2012
Jiro Yokoya, Kawasaki, JP;
Tsuyoshi Nakamura, Kawasaki, JP;
Hiroaki Shimizu, Kawasaki, JP;
Masaru Takeshita, Kawasaki, JP;
Hideto Nito, Kawasaki, JP;
Hirokuni Saito, Kawasaki, JP;
Jiro Yokoya, Kawasaki, JP;
Tsuyoshi Nakamura, Kawasaki, JP;
Hiroaki Shimizu, Kawasaki, JP;
Masaru Takeshita, Kawasaki, JP;
Hideto Nito, Kawasaki, JP;
Hirokuni Saito, Kawasaki, JP;
TOKYO OHKA KOGYO CO., LTD., Kawasaki-Shi, JP;
Abstract
A method of forming a resist pattern, including forming a resist film on a substrate using a resist composition comprising a base component that exhibits increased solubility in an alkali developing solution and a photo-base generator component; exposing the resist film; baking the exposed resist film, such that, at an exposed portion thereof, the base generated from the photo-base generator component upon the exposure and an acid provided to the resist film are neutralized, and at an unexposed portion of the resist film, the solubility of the base component in an alkali developing solution is increased by the acid provided to the resist film; and subjecting the resist film to alkali development, thereby forming a negative-tone resist pattern in which the unexposed portion of the resist film has been dissolved and removed.