The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 09, 2016
Filed:
May. 05, 2015
Applicant:
United Microelectronics Corp., Hsin-Chu, TW;
Inventors:
En-Chiuan Liou, Tainan, TW;
Yi-Jing Wang, Tainan, TW;
Assignee:
UNITED MICROELECTRONICS CORP., Hsin-Chu, TW;
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/14 (2006.01); G01N 21/95 (2006.01); G01B 11/27 (2006.01); G01N 21/88 (2006.01);
U.S. Cl.
CPC ...
G01N 21/9501 (2013.01); G01B 11/27 (2013.01); G01N 21/8806 (2013.01); G01N 2021/8825 (2013.01);
Abstract
An overlay measurement method includes providing three predetermined patterns, including a first predetermined pattern, a second predetermined pattern and a third predetermined pattern. An inspection process is then performed on said three predetermined patterns, to obtain three image points, including a first image point, a second image point and a third image point respectively. Next, a defining process is performed to define a default position, and a calculating process is performed to obtain a real offset value x=(p−q)*(c−a)/(a−b)+p.