The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 26, 2016
Filed:
Sep. 16, 2014
Disco Corporation, Tokyo, JP;
Kazuhisa Arai, Tokyo, JP;
Disco Corporation, Tokyo, JP;
Abstract
A manufacturing method for a photomask for wafer processing includes a step of forming a groove on the front side of a light shielding plate in an area where light is to be passed. The groove has a depth not reaching the back side of the light shielding plate. A uniting step applies a bonding agent capable of transmitting light to the front side of the light shielding plate after performing the groove forming step and next attaching a transparent plate through the bonding agent to the front side of the light shielding plate to thereby unite the light shielding plate and the transparent plate. A grinding step holds the transparent plate on a chuck table after performing the uniting step. The back side of the light shielding plate is ground until the groove is exposed to the back side of the light shielding plate.