The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 19, 2016
Filed:
Dec. 23, 2014
Dow Global Technologies Llc, Midland, MI (US);
Rohm and Haas Electronic Materials Llc, Marlborough, MA (US);
Shih-Wei Chang, Natick, MA (US);
Jong Keun Park, Westborough, MA (US);
John W. Kramer, Mt. Pleasant, MI (US);
Erin B. Vogel, Midland, MI (US);
Phillip D. Hustad, Natick, MA (US);
Peter Trefonas, III, Medway, MA (US);
DOW GLOBAL TECHNOLOGIES LLC, Midland, MI (US);
ROHM AND HAAS ELECTRONIC MATERIALS LLC, Marlborough, MA (US);
Abstract
Disclosed herein is a block copolymer comprising a first block derived from a vinyl aromatic monomer; where the vinyl aromatic monomer has at least one alkyl substitution on an aromatic ring; a second block derived from a siloxane monomer; where a chi parameter that measures interactions between the first block and the second block is 0.03 to 0.18 at a temperature of 200° C. Disclosed herein is a method comprising polymerizing a vinyl aromatic monomer to form a first block; and polymerizing a second block onto the first block to form a block copolymer; where the second block is derived by polymerizing a siloxane monomer; and where the block copolymer has a chi parameter of 0.03 to 0.18 at a temperature of 200° C.; where the chi parameter is a measure of interactions between the first block and the second block of the copolymer.