The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 12, 2016

Filed:

Jan. 09, 2015
Applicant:

Kabushiki Kaisha Toshiba, Minato-ku, JP;

Inventors:

Toshiki Hikosaka, Kawasaki, JP;

Hisashi Yoshida, Koto, JP;

Hajime Nago, Yokohama, JP;

Shinya Nunoue, Ichikawa, JP;

Assignee:

Kabushiki Kaisha Toshiba, Minato-ku, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/201 (2006.01); H01L 33/00 (2010.01); H01L 33/32 (2010.01); H01L 29/20 (2006.01); H01L 29/205 (2006.01); H01L 21/02 (2006.01); H01L 33/02 (2010.01);
U.S. Cl.
CPC ...
H01L 29/201 (2013.01); H01L 21/0254 (2013.01); H01L 21/0262 (2013.01); H01L 21/02381 (2013.01); H01L 21/02433 (2013.01); H01L 21/02458 (2013.01); H01L 21/02505 (2013.01); H01L 29/2003 (2013.01); H01L 29/205 (2013.01); H01L 33/0025 (2013.01); H01L 33/32 (2013.01); H01L 21/02584 (2013.01); H01L 33/025 (2013.01);
Abstract

According to one embodiment, a nitride semiconductor element includes a functional layer and a stacked body. The stacked body includes a GaN intermediate layer, a low Al composition layer, a high Al composition layer, and a first Si-containing layer. The low Al composition layer includes a nitride semiconductor having a first Al composition ratio. The low Al composition layer is provided between the GaN intermediate layer and the functional layer. The high Al composition layer includes a nitride semiconductor having a second Al composition ratio. The high Al composition layer is provided between the GaN intermediate layer and the low Al composition layer. The second Al composition ratio is higher than the first Al composition ratio. The first Si-containing layer is provided between the GaN intermediate layer and the high Al composition layer.


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