The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 07, 2016

Filed:

Jan. 21, 2013
Applicant:

United Microelectronics Corp., Hsin-Chu, TW;

Inventors:

Lu-An Chen, Hsinchu County, TW;

Tien-Hao Tang, Hsinchu, TW;

Assignee:

UNITED MICROELECTRONICS CORP., Science-Based Industrial Park, Hsin-Chu, TW;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 23/62 (2006.01); H01L 29/861 (2006.01); H01L 27/02 (2006.01);
U.S. Cl.
CPC ...
H01L 29/861 (2013.01); H01L 27/0248 (2013.01); H01L 27/0255 (2013.01); H01L 27/0259 (2013.01); H01L 27/0274 (2013.01);
Abstract

The present invention discloses a transistor structure for electrostatic discharge protection. The structure includes a substrate, a doped well, a first doped region, a second doped region and a third doped region. The doped well is disposed in the substrate and has a first conductive type. The first doped region is disposed in the substrate, encompassed by the doped well and has the first conductive type. The second doped region is disposed in the substrate, encompassed by the doped well and has a second conductive type. The third doped region is disposed in the substrate, encompassed by the doped well and has the second conductive type. A gap is disposed between the first doped region and the second doped region.


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