The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 07, 2016
Filed:
Jun. 05, 2013
Sony Corporation, Tokyo, JP;
Tokyo Electron Limited, Tokyo, JP;
Hayato Iwamoto, Tokyo, JP;
Yoshiya Hagimoto, Tokyo, JP;
Tomoki Tetsuka, Fukuoka, JP;
Shinichiro Shimomura, Koshi, JP;
Teruomi Minami, Koshi, JP;
Hiroki Sakurai, Koshi, JP;
Hirotaka Maruyama, Koshi, JP;
Yosuke Kawabuchi, Koshi, JP;
Hiroshi Tanaka, Koshi, JP;
Sony Corporation, Minato-Ku, JP;
Tokyo Electron Limited, Minato-Ku, JP;
Abstract
A wafer is held horizontally and rotated by a substrate holding mechanism. An aqueous alkaline solution is supplied to a wafer by a nozzle and caused to flow from a central portion to a peripheral edge portion of the wafer, thereby etching the wafer. An amount of oxygen, which is equal to or more than the amount of oxygen in atmospheric air involved in the aqueous alkaline solution flowing on the wafer, is previously dissolved in the aqueous alkaline solution.