The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 07, 2016
Filed:
Nov. 16, 2012
Applicant:
Dcg Systems, Inc., Fremont, CA (US);
Inventors:
Keith Serrels, Fremont, CA (US);
Prasad Sabbineni, San Ramon, CA (US);
James S. Vickers, San Jose, CA (US);
Assignee:
DCG SYSTEMS, INC., Fremont, CA (US);
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K 9/36 (2006.01); G06K 9/32 (2006.01); G02B 21/00 (2006.01); G02B 27/58 (2006.01);
U.S. Cl.
CPC ...
G06K 9/3233 (2013.01); G02B 21/002 (2013.01); G02B 21/0092 (2013.01); G02B 27/58 (2013.01);
Abstract
A method of obtaining two orthogonally polarized super-resolution images is provided. A first diffraction-limited image is obtained using horizontally polarized light; a second diffraction-limited image is obtained using vertically polarized light; and, the first and second images are processed so as to yield a convoluted image having super diffraction-limited performance in both dimensions. Enhanced alignment of CAD image to acquired image is facilitated using the horizontally and vertically polarized images.