The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 07, 2016

Filed:

Feb. 14, 2013
Applicants:

Shin-etsu Handotai Co., Ltd., Tokyo, JP;

Speedfam Co., Ltd., Kanagawa, JP;

Inventors:

Tadahiro Kato, Fukushima, JP;

Akitoshi Enari, Kanagawa, JP;

Mitsutaka Irago, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 9/06 (2006.01); B24B 27/00 (2006.01); H01L 21/304 (2006.01);
U.S. Cl.
CPC ...
B24B 9/065 (2013.01); B24B 27/0069 (2013.01); B24B 27/0076 (2013.01); H01L 21/304 (2013.01);
Abstract

[Object] An outer periphery polishing apparatus capable of polishing the edge of workpieces having different bevel angles is to be provided. [Solution] Edge polishing unitsA,B for polishing the front surface edge Ea and the rear surface edge Eb of the workpiece W each include a polishing member mounting structureto which a polishing memberis attached, a mounting structure support unitthat tiltably supports the polishing member mounting structure, a mounting structure angle adjustment mechanismthat adjusts a tilt angle of the polishing member mounting structure, a reciprocation support basethat supports the mounting structure support unitso as to move along a reciprocation line, a base support unitthat tiltably supports the reciprocation support base, a base angle adjustment mechanismthat adjusts the tilt angle of the reciprocation support baseso as to be parallel to the edge Eb of the workpiece W, and a pedestalthat supports the base support unitso as to allow positional correction in a vertical direction and a horizontal direction.


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