The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 31, 2016
Filed:
Nov. 29, 2011
Michio Sato, Yokohama, JP;
Takashi Hino, Yokohama, JP;
Takashi Rokutanda, Yokohama, JP;
Masashi Nakatani, Kamakura, JP;
Michio Sato, Yokohama, JP;
Takashi Hino, Yokohama, JP;
Takashi Rokutanda, Yokohama, JP;
Masashi Nakatani, Kamakura, JP;
KABUSHIKI KAISHA TOSHIBA, Tokyo, JP;
TOSHIBA MATERIALS CO., LTD., Kanagawa-Ken, JP;
Abstract
The present invention provides a plasma etching apparatus componentincludes a base materialand an yttrium oxide coatingformed by an impact sintering process and configured to cover a surface of the base material. The yttrium oxide coatingcontains at least one of particulate portions and non-particulate portions. The yttrium oxide coatinghas a film thickness of 10 μm or above and a film density of 90% or above. The particulate portions have an area coverage ratio of 0 to 80% and the non-particulate portions have an area coverage ratio of 20 to 100%.