The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 31, 2016
Filed:
Nov. 14, 2014
Mapper Lithography Ip B.v., Delft, NL;
Willem Henk Urbanus, Delft, NL;
Marco Jan-Jaco Wieland, Delft, NL;
MAPPER LITHOGRAPHY IP B.V., Delft, NL;
Abstract
The invention relates to an electrode stack () comprising stacked electrodes (-) for manipulating a charged particle beam along an optical axis (A). Each electrode comprises an electrode body with an aperture for the charged particle beam. The electrode bodies are mutually spaced and the electrode apertures are coaxially aligned along the optical axis. The electrode stack comprises electrically insulating spacing structures () between each pair of adjacent electrodes for positioning the electrodes (-) at predetermined mutual distances along the axial direction (Z). A first electrode and a second electrode each comprise an electrode body with one or more support portions (), wherein each support portion is configured to accommodate at least one spacing structure (). The electrode stack has at least one clamping member (-) configured to hold the support portions () of the first and second electrodes, as well as the intermediate spacing structure () together.