The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 24, 2016
Filed:
Mar. 26, 2013
Hitachi Chemical Company, Ltd., Tokyo, JP;
Tomohiro Iwano, Hitachi, JP;
Hisataka Minami, Hitachi, JP;
Toshiaki Akutsu, Hitachi, JP;
Koji Fujisaki, Kokubunji, JP;
HITACHI CHEMICAL COMPANY, LTD., Tokyo, JP;
Abstract
A polishing liquid comprising an abrasive grain, an additive, and water, wherein the abrasive grain includes a hydroxide of a tetravalent metal element, produces absorbance of 1.00 or more for light having a wavelength of 400 nm in an aqueous dispersion having a content of the abrasive grain adjusted to 1.0 mass %, and produces light transmittance of 50%/cm or more for light having a wavelength of 500 nm in an aqueous dispersion having a content of the abrasive grain adjusted to 1.0 mass %, and a difference between a NOconcentration of an aqueous dispersion having a content of the abrasive grain adjusted to 1.0 mass % and a NOconcentration after retaining the aqueous dispersion at 60° C. for 72 hours is 200 ppm or less.