The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 10, 2016

Filed:

Sep. 20, 2012
Applicant:

Ulvac, Inc., Chigasaki-shi, JP;

Inventors:

Junichi Hamaguchi, Susono, JP;

Shuji Kodaira, Susono, JP;

Yuta Sakamoto, Susono, JP;

Akifumi Sano, Susono, JP;

Koukichi Kamada, Susono, JP;

Yoshiyuki Kadokura, Susono, JP;

Joji Hiroishi, Susono, JP;

Yukinobu Numata, Susono, JP;

Koji Suzuki, Susono, JP;

Assignee:

ULVAC, INC., Chigasaki-Shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/4763 (2006.01); H01L 21/768 (2006.01); H01L 23/532 (2006.01); H01L 21/285 (2006.01); C23C 14/02 (2006.01); C23C 14/04 (2006.01); C23C 14/16 (2006.01); C23C 14/14 (2006.01); C23C 14/34 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76882 (2013.01); C23C 14/024 (2013.01); C23C 14/046 (2013.01); C23C 14/14 (2013.01); C23C 14/16 (2013.01); C23C 14/34 (2013.01); H01L 21/2855 (2013.01); H01L 21/76841 (2013.01); H01L 21/76871 (2013.01); H01L 21/76879 (2013.01); H01L 23/53238 (2013.01); H01L 2924/0002 (2013.01);
Abstract

A method of manufacturing a semiconductor device includes a groove portion formation process of forming a groove portion in a base body, a bather layer formation process of forming a barrier layer covering at least the inner wall surface of the groove portion, a seed layer formation process of forming a seed layer covering the barrier layer, and a seed layer melting process of causing the seed layer to be melted using the reflow method. The seed layer is made of Cu.


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