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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9337017 B1

PDFFull Text
Date of Patent:
May. 10, 2016

Filed:

Aug. 11, 2014

Method for repairing damages to sidewalls of an ultra-low dielectric constant film

Applicants:

Shaohai Zeng, Shanghai, CN;

Qingyun Zuo, Shanghai, CN;

Ming LI, Shanghai, CN;

Inventors:

Shaohai Zeng, Shanghai, CN;

Qingyun Zuo, Shanghai, CN;

Ming Li, Shanghai, CN;

Assignee:

SHANGHAI IC R&D CENTER CO., LTD, Shanghai, CN;

Attorney:
Primary Examiner:

Chuong A Luu

Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 21/302 (2006.01); H01L 21/768 (2006.01); H01L 21/3105 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02274 (2013.01); H01L 21/0231 (2013.01); H01L 21/02063 (2013.01); H01L 21/02101 (2013.01); H01L 21/302 (2013.01); H01L 21/3105 (2013.01); H01L 21/76814 (2013.01); H01L 21/76826 (2013.01);
Abstract

A method for repairing damages to sidewalls of an ultra-low dielectric constant film is disclosed by the present invention comprises the following steps: depositing an ultra-low dielectric constant film on an semiconductor substrate; dry-etching the ultra-low dielectric constant film to form a sidewall structure thereof; performing wet cleaning by using a chemical agent containing an unsaturated hydrocarbon having —O—C(Re)x; and performing ultraviolet curing. The present invention can restore pores size and porosity of the ultra-low dielectric constant film, and to keep effective dielectric constant to a minimum.

Find Patent Forward Citations

Zeng, Shaohai. (2016). Method for repairing damages to sidewalls of an ultra-low dielectric constant film (U.S. Patent No. 9337017). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9337017

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